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CARBON NITRIDE FILMS PREPARED AT DIFFERENT N2/Ar RATIOS BY CLOSED FIELD UNBALANCED REACTIVE MAGNETRON SPUTTERING

A.Vyas , K.Y.Li , Z.F.Zhou , Y.G.Shen

金属学报(英文版)

Carbon nitride ( CNx thin films have been deposited onto Si(100) (for structural and mechanical analyses) and M42 high-speed-steel (for tribological measurements) substrates at room temperature by closed-field unbalanced magnetron sputtering. The mechanical and tribological properties of these films were highly dependent on the N/C concentration ratio that was adjusted by the F(N2)/F(Ar) flow-rate ratio at fixed substrate biasing of -60V during deposition. The films were characterized by employing scanning electron microscopy (SEM), atomic force microscopy (AFM), nano-indentation measurements, X-ray photoelectron spectroscopy (XPS), Raman scattering and Fourier transform infrared (FTIR) spectroscopy, pin-on-disc tribometer, scratch tester, and Rockwell-C tester. The results showed that the N content in the films increased with the N2 pressure. However, the maximum N/C ratio obtained was 0.25. The nanohardness was measured to be in the range of 11.7-20.8 GPa depending on the N/C ratios. The XPS N 1s spectra showed the existence of both N-C sp^2 and N-C sp^3 bonds in films. Raman and FTIR spectra exhibited that N-C bonds were fewer when compared to other N-C bonds. The friction coefficient of the film deposited onto steel substrate with N/C=0.26 was measured to be -0.08 and for film with N/C=0.22 a high critical load of 70N was obtained. The tribological data also showed that the wear rates of these films were in the range of -10^-16m^3/Nm, indicating excellent wear resistance for CNx films.

关键词: carbon nitride , null , null

不锈钢表面电镀金及真空镀氮化碳多层膜研究

张波 , 匡加成 , 王良

电镀与精饰 doi:10.3969/j.issn.1001-3849.2017.02.001

根据燃料电池电极片的技术要求,在不锈钢电极片表面实现电镀金和真空镀氮化碳多层膜.基于基层镀镍的工艺条件,研究了镀金溶液pH对镀层色泽的影响,电流密度对镀金沉积速度的影响,盐雾试验与镀层厚度关系,温度对镀金层电阻率的影响,获得了镀金的最优配方和工艺.开展了不合格镀金层的退除及金的回收研究,基于真空镀氮化碳薄膜工艺条件,对多层膜的表面形貌进行了表征,多层膜显著提高耐蚀性能的同时具有较好的结合力.多层膜制备与工艺研究将进一步扩大其在各领域中的应用.

关键词: 电极片 , 镀金 , 溅射 , 氮化碳 , 多层膜

超分子自组装法制备氮化碳聚合物光催化剂

郑云 , 王心晨

中国材料进展 doi:10.7502/j.issn.1674-3962.2017.01.04

利用光催化技术将低密度的太阳能转化为高密度的化学能或直接降解有机污染物,是解决能源短缺和环境污染等问题的理想途径.氮化碳是近期发展出来的一类聚合物半导体新型光催化剂,在分解水制氢、污染物降解、二氧化碳还原、选择性有机合成等研究方面有着重要科学意义和应用前景.前驱物超分子自组装法是制备高效纳米氮化碳光催化剂的重要合成方法之一.通过分子间的弱相互作用力,如三聚氰胺与三嗪衍生物之间的氢键相互作用,形成有序的超分子组装体,再进一步焙烧热聚合可制备氮化碳纳米材料.通过控制自组装过程的反应参数和条件,可以有效地调控氮化碳的组成、形貌、能带结构、光学性能、光生载流子分离效率,从而提高氮化碳的光催化性能.综述了超分子自组装法合成氮化碳光催化剂的最新研究进展,总结了系列纳米结构氮化碳光催化剂的研究工作,包括共聚合改性氮化碳、非金属掺杂氮化碳、金属掺杂氮化碳、金属氧化物-氮化碳复合物、氮化碳异质结以及高结晶度氮化碳光催化剂等.同时阐述了超分子自组装法对氮化碳的组成、结构和光催化性能的调控作用,并就该研究领域未来发展进行了展望.

关键词: 氮化碳 , 纳米材料 , 超分子自组装 , 光催化 , 分解水 , 降解污染物

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